Why do we use LDD(lightly doped drain) in IC fabrication technology?
In the "silicon VLSI technology" book, was mentioned that this is in order to create a voltage drop in drain region. So don't you think this force the supply voltage greater?
Why do we use LDD(lightly doped drain) in IC fabrication technology?
In the "silicon VLSI technology" book, was mentioned that this is in order to create a voltage drop in drain region. So don't you think this force the supply voltage greater?
A Low Doped Drain (LDD) region is basically what it sounds like. You add an extension to the (highly) doped drain that is low doped. This extension reduces the electric field at the pinchoff region. Reducing the electric field strength helps reduce short channel effects and hot electron effects. It can also increase the breakdown voltage.