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I have a question regarding the standard cell design flow in an ASIC design flow.

That being said I understand what a gate array design flow is. It being more or less a fixed logic FPGA. Structured design flow directly follows, which basically means that the lithographic layers include specialized design blocks like memories, controllers, PLLs and others. In some sense they are also tidily coupled with an FPGA since FPGAs also often incorporate some predefined blocks like memories, PLLs and so on.

On the other side of the spectrum there is the full custom design flow where the designer needs to specify the placing of every single transistor of the device. This means that all lithographic layers need to be customized for a full custom design.

Somewhere in between there is the standard cell design flow. I do understand that a standard cell basically encapsulates the functionality of a specific gate or cell. We can have cells that implement an AND gate, an OR gate, or even something like a full adder, PLL, or a flip-flop.

But even with a standard cell design flow the foundry would still need to create all the lithographic layers for the design. Otherwise it wouldn't really differ from a gate array design flow. If the foundries actually need to manufacture every layer where does the benefit of a standard cell design stand beside the obvious simpler design flow and lesser risks in the implementation?

Is the standard cell design flow basically a full custom design flow but with predefined cells? If not what are the differences? I could imagine that the manufacturing process of the lithographic layers for a standard cell design could be easier for the foundry since their production pipelines already are configured for their standard cells. However I fail to find any information that would confirm my speculations.

What I try to understand is how a standard cell design flow differs from a full custom one from the manufacturing perspective. I would also appreciate any sources that would clarify this topic.

ocrdu
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patvax
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  • Full-custom design flow is used to design and harden the standard cell itself with transistors, but not an entire multi-million transistor chips in today's generation, because it is not feasible for time to market, human effort, cost. By having standard cells, the effort has been significantly reduced as the designer now has to think it like building blocks which have to be connected each other, instead of thinking at how it should be designed at transistor level. It also enhances scalability and simplifies Timing/Power/Area analysis of the full design. – Mitu Raj Sep 23 '22 at 19:06
  • So it doesn't really make a diffrence for the foundries? It is after all just a simplification in development of ASICs. I guess then manufacturing cost should be more or less the same for full custom flow and standard cell flow(development/design excluded). – patvax Sep 26 '22 at 09:46
  • For foundry, it doesn't make much difference as you have to fabricate say 100M transistors either way. The difference is at the abstraction of physical design of the chip before GDS2. Engineering cost reduces for standard cell flow, manufacturing cost is only a part of engineering cost. – Mitu Raj Sep 26 '22 at 10:15

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